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Second hand machine information

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アドテック認定中古機の画像

ADTEC’s Exclusive Sales of Reliable Secondhand Equipment

①Overhauled … All items are meticulously repaired and ready for production work.
②Custom specifications … As far as possible we will reflect specifications to your needs.
③Warranty … All items come with the same 6-month warranty as new products.
④High-priced purchase … We will purchase your unneeded exposure systems at a high price (only our equipment)

Line Up(October 2022 update)

IP-3600HH
Direct Imaging Exposure System
for Circuit Formation  

   

Exposure method

Direct imaging

Board size

334×334~534×622mm

Exposure light source

Laser Diode / 405nm

Resolution

L/S = 12/12μm

Alignment

±10μm

Flow direction

Right to left (R flow)
*One-sided machine

ADEX5000S 
Automatic Exposure System
for Solder Resist

ADEX5000S ソルダーレジスト用 自動露光装置の画像

Exposure method

Vacuum contact

Board size

250×300~510×610mm

Exposure light source

2-lamp/5kW ultra-high-pressure mercury lamp

Resolution

SRO = Φ50 μm

Alignment

±5μm

Flow direction

Right to left (R flow)

ADEX3000PV 
Automatic Exposure System 
for Inner/Outer Layer Circuits 

   

Exposure method

Vacuum contact

Board size

250×300~535×625mm

Exposure light source 

1-lamp/5kW ultra-high-pressure mercury lamp

Resolution

L/S = 40/40μm

Alignment

±10μm

Flow direction

Left to right (L flow)

ADEX3000PB 
Automatic Exposure System 
for Inner/Outer Layer Circuits 

  

Exposure method

Vacuum contact

Board size

250×300~535×625mm

Exposure light source 

1-lamp/5kW ultra-high-pressure mercury lamp

Resolution

L/S = 40/40μm

Alignment

±10μm

Flow direction

①:Left to right (L flow)
②:Left to right (L flow)

ANEX-A2161 
Automatic Exposure System
for Inner/Outer Layer Circuits

  

Exposure method

Air-press contact

Board size

250×300~535×625mm

Exposure light source

1-lamp/5kW ultra-high-pressure mercury lamp

Resolution

L/S = 40/40μm

Alignment

±10μm

Flow direction

Left to right (L flow)

ANEX-A3161 
Automatic Exposure System
for Solder Resist

  

Exposure method

Vacuum contact

Board size

250×300~535×625mm

Exposure light source

2-lamp/10kW metal halide lamp

Resolution

φ100μm

Alignment

±10μm

Flow direction

Left to right (L flow)

ADE1200P/1300P 
Automatic Double-sided Simultaneous Exposure System
for Internal Layersnew old stock

ADE1200P/1300P 内層用 自動両面同時露光装置の画像

Exposure method

Vacuum contact

Board size

254×305~559×635mm

Exposure light source

2-lamp/10kW metal halide lamp

Resolution

L/S = 75/75μm

Alignment

±10μm/±5μm

Flow direction

①:Right to left (R flow)
②:Left to right (L flow)

AFLX2600P
Roll to Roll Double-sided Simultaneous Exposure System  
new old stock

AFLX2600P Roll to Roll 両面同時露光装置の画像

Exposure method

Vacuum contact

Board size

250mm or 500mm

Exposure light source

2-lamp/5kW ultra-high-pressure mercury lamp

Resolution

L/S = 12/12μm

Alignment

±10μm

Flow direction

①:Right to left (R flow)
②:Left to right (L flow)

EV-2400
Automatic Exposure System
for Outer Layer Circuits for smaller boards   

  

Exposure method

Vacuum contact

Board size

250×330~535×635mm

Exposure light source

5kW ultra-high-pressure mercury lamp

Resolution

L/S = 75/75μm

Alignment

±10μm

Flow direction

Right to left (R flow)

EV-1200
Semi-Automatic Exposure System 
for Outer Layer Circuits for smaller boards   

  

Exposure method

Vacuum contact

Board size

250×250~535×635mm

Exposure light source

5kW ultra-high-pressure mercury lamp

Resolution

L/S = 75/75μm

Alignment

±10μm

Flow direction

IS-4000H 
Direct Imaging Exposure System
for Circuit Formationnew old stock

  

Exposure method

Direct imaging

Board size

334×334~551×640mm

Exposure light source

Laser Diode / 375+405nm

Resolution

L/S = 15/15 μm

Alignment

±7.5μm

Flow direction

①:Right to left (R flow)
②:Left to right (L flow)